Actinic radiation emissive pattern defining masks for fine line lithography and lithography utilizing such masks

An actinic radiation emissive mask for a high resolution lithography emits actinic radiation which originates within the mask. The mask patterns the actinic radiation to expose resist in accordance with a desired pattern. The actinic radiation originating in the mask may be produced by radioactivity...

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Bibliographische Detailangaben
Hauptverfasser:	REEKSTIN, JR., JOHN P, JONES, A. BROOKE, ELKINS, PERRY E
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR APPLICATIONS OF RADIATION FROM RADIOACTIVE SOURCES, NOTOTHERWISE PROVIDED FOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OBTAINING ENERGY FROM RADIOACTIVE SOURCES ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS UTILISING COSMIC RADIATION
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Beschreibung
Zusammenfassung:	An actinic radiation emissive mask for a high resolution lithography emits actinic radiation which originates within the mask. The mask patterns the actinic radiation to expose resist in accordance with a desired pattern. The actinic radiation originating in the mask may be produced by radioactivity, stimulated emission or combinations thereof.