Process and arrangement for the enrichment of gases
An initial gaseous mixture of at least two components is passed through an adsorber which preferentially adsorbs one of the components. This initially loads the adsorber. Subsequently, another gaseous mixture, having a greater proportion of the preferentially adsorbed component than the initial gase...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | An initial gaseous mixture of at least two components is passed through an adsorber which preferentially adsorbs one of the components. This initially loads the adsorber. Subsequently, another gaseous mixture, having a greater proportion of the preferentially adsorbed component than the initial gaseous mixture, is passed through the adsorber so as to additionally load the adsorber. Part of the gas in the adsorber is then removed. This initially unloads the adsorber and yields a first fraction containing both components, with the proportion of the preferentially adsorbed component being greater than that in the initial gaseous mixture. The remainder of the gas in the adsorber is removed next so as to completely unload the adsorber. This results in a second fraction including both components and wherein the proportion of the preferentially adsorbed component is greater than that in both the second gaseous mixture to be passed through the adsorber and the first fraction removed from the adsorber. The first fraction may be used for additionally loading the adsorber during a subsequent cycle. An advantageous arrangement for carrying out the process is also disclosed. |
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