POSITIVE OR NEGATIVE DEVELOPABLE PHOTOSENSITIVE COMPOSITION

1426890 Photopolymerizable materials MINNESOTA MINING & MFG CO 19 Nov 1973 [20 Nov 1972] 53665/73 Heading G2C [Also in Division C3] Positive or negative working photopolymerizable elements comprise a substrate bearing a light-sensitive layer of a composition comprising (1) at least one free radi...

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Bibliographische Detailangaben
Hauptverfasser:	RICH, LARRY D
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Zusammenfassung:	1426890 Photopolymerizable materials MINNESOTA MINING & MFG CO 19 Nov 1973 [20 Nov 1972] 53665/73 Heading G2C [Also in Division C3] Positive or negative working photopolymerizable elements comprise a substrate bearing a light-sensitive layer of a composition comprising (1) at least one free radical polymerizable monomer having at least one ethylenically unsaturated terminal group and a boiling point above 100C (2) at least one photoinitiator in an amount sufficient to polymerize the monomer(s) upon exposure to actinic radiation, and (3) a blend comprising (a) at least one acid-soluble amino-containing polymer and (b) at least one compatible, acidinsoluble, film-forming polymer. The compositions may additionally include such additives as pigments and sensitizers. After exposure, positive development can be achieved with dilute acid, e.g. 2-5% aqueous acetic acid; alternatively negative development is effected by treating with a dilute base, e.g. 0.1% ammonia solution. In Examples the amino polymer is selected from poly(2- dimethylaminoethyl methacrylate), poly(2- diethylaminoethyl methacrylate), poly(3-dimethylaminopropyl methacrylate), poly(11-dimethylaminoundecyl methacrylate), and copolymers of 2-dimethylaminoethyl methacrylate with isoarryl acrylate, lauryl methacrylate or tetrahydrofurfuryl methacrylate; and the acid-insoluble polymer is selected from polyvinyl acetate having pendant carboxyl groups, polyvinyl formal, hydroxypropylcellulose, diacetone acrylamide/formaldehyde condensation product and vinylpyrrolidone/methyl methacrylate copolymer. Applications include silk screen printing of Fig. 3 (not shown) printed cir cuits and lithographic plates. The p/p composition may be coated on a polyester support subbed with a polyvinyl alcohol or any watersoluble polymer and be covered with a film (e.g. polyethylene) which can be removed so that the p/p layer can be applied to a silk screen and the support peeled off so it can be used in silk screen printing.