METHOD FOR REMOVING PHOTORESIST IN MANUFACTURE OF SEMICONDUCTOR DEVICES

Dry method for removing photoresist utilizing gases excited by electrodeless radio frequency excitation, commonly called glow discharge in the manufacture of semiconductor devices.

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Bibliographische Detailangaben
Hauptverfasser:	LEMONS K,US, IRVING S,US
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Dry method for removing photoresist utilizing gases excited by electrodeless radio frequency excitation, commonly called glow discharge in the manufacture of semiconductor devices.