METHOD OF MAKING SEMICONDUCTOR DEVICES

METHOD OF MAKING SEMICONDUCTOR DEVICES

The surface of a semiconductor substrate is exposed to an aqueous solution containing an alkali solution immediately before depositing an insulating film of SiO2 or the like on that surface, whereby positive charges are induced in the surface of the semiconductor substrate which is covered with the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MIYAZAKI T,JA, YOSHIDA I,JA, TOKUYAMA T,JA, NISHIMATSU S,JA, KOZUKA H,JA, MORI T,JA
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:The surface of a semiconductor substrate is exposed to an aqueous solution containing an alkali solution immediately before depositing an insulating film of SiO2 or the like on that surface, whereby positive charges are induced in the surface of the semiconductor substrate which is covered with the insulating film.