VAPOR ADSORPTION PROCESS

The present invention relates to an improved vapor adsorption process, and more particularly, to an adsorption process for removing desired components from an inlet gas stream. By the present invention a bed of solid adsorbent is contacted with a selected adsorbable material during the regeneration...

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Hauptverfasser: SNYDER C,US, CASAD B,US
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to an improved vapor adsorption process, and more particularly, to an adsorption process for removing desired components from an inlet gas stream. By the present invention a bed of solid adsorbent is contacted with a selected adsorbable material during the regeneration thereof, which material has the property of being displaced from the adsorbent bed by desired components contained in the inlet gas stream and a heat of desorption equal to or greater than the heat of adsorption of the desired components. When the bed is contacted with the inlet gas stream, desired components contained therein are adsorbed thereby displacing the previously adsorbed selected adsorbable material from the bed which results in the temperature of the bed remaining relatively constant and the utilization of the maximum bed adsorption capacity.