ELECTROLESS COPPER PLATING

An improved aqueous autocatalytic copper deposition solution is provided which comprises maintaining in a solution, containing complexing and reducing agents for the copper ion and a pH adjuster, a small effective amount of a compound providing a metal value selected from the group consisting of mol...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JOHN DUFF WILLIAMSON, FREDERICK W. SCHNEBLE JR, RUDOLPH J. ZEBLISKY, JOHN F. MCCORMACK
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator JOHN DUFF WILLIAMSON
FREDERICK W. SCHNEBLE JR
RUDOLPH J. ZEBLISKY
JOHN F. MCCORMACK
description An improved aqueous autocatalytic copper deposition solution is provided which comprises maintaining in a solution, containing complexing and reducing agents for the copper ion and a pH adjuster, a small effective amount of a compound providing a metal value selected from the group consisting of molybdenum, niobium, tungsten, rhenium, rare earths of the actinide series, rare earths of the lanthanide series, and mixtures of the foregoing. Additionally, an improved method of depositing electroless copper is provided which comprises employing the solution hereinabove defined.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US3650777A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US3650777A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US3650777A3</originalsourceid><addsrcrecordid>eNrjZJBy9XF1Dgny93ENDlZw9g8IcA1SCPBxDPH0c-dhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfGhwcZmpgbm5uaOxoRVAADLXh_O</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ELECTROLESS COPPER PLATING</title><source>esp@cenet</source><creator>JOHN DUFF WILLIAMSON ; FREDERICK W. SCHNEBLE JR ; RUDOLPH J. ZEBLISKY ; JOHN F. MCCORMACK</creator><creatorcontrib>JOHN DUFF WILLIAMSON ; FREDERICK W. SCHNEBLE JR ; RUDOLPH J. ZEBLISKY ; JOHN F. MCCORMACK</creatorcontrib><description>An improved aqueous autocatalytic copper deposition solution is provided which comprises maintaining in a solution, containing complexing and reducing agents for the copper ion and a pH adjuster, a small effective amount of a compound providing a metal value selected from the group consisting of molybdenum, niobium, tungsten, rhenium, rare earths of the actinide series, rare earths of the lanthanide series, and mixtures of the foregoing. Additionally, an improved method of depositing electroless copper is provided which comprises employing the solution hereinabove defined.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1972</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19720321&amp;DB=EPODOC&amp;CC=US&amp;NR=3650777A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19720321&amp;DB=EPODOC&amp;CC=US&amp;NR=3650777A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JOHN DUFF WILLIAMSON</creatorcontrib><creatorcontrib>FREDERICK W. SCHNEBLE JR</creatorcontrib><creatorcontrib>RUDOLPH J. ZEBLISKY</creatorcontrib><creatorcontrib>JOHN F. MCCORMACK</creatorcontrib><title>ELECTROLESS COPPER PLATING</title><description>An improved aqueous autocatalytic copper deposition solution is provided which comprises maintaining in a solution, containing complexing and reducing agents for the copper ion and a pH adjuster, a small effective amount of a compound providing a metal value selected from the group consisting of molybdenum, niobium, tungsten, rhenium, rare earths of the actinide series, rare earths of the lanthanide series, and mixtures of the foregoing. Additionally, an improved method of depositing electroless copper is provided which comprises employing the solution hereinabove defined.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1972</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJBy9XF1Dgny93ENDlZw9g8IcA1SCPBxDPH0c-dhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfGhwcZmpgbm5uaOxoRVAADLXh_O</recordid><startdate>19720321</startdate><enddate>19720321</enddate><creator>JOHN DUFF WILLIAMSON</creator><creator>FREDERICK W. SCHNEBLE JR</creator><creator>RUDOLPH J. ZEBLISKY</creator><creator>JOHN F. MCCORMACK</creator><scope>EVB</scope></search><sort><creationdate>19720321</creationdate><title>ELECTROLESS COPPER PLATING</title><author>JOHN DUFF WILLIAMSON ; FREDERICK W. SCHNEBLE JR ; RUDOLPH J. ZEBLISKY ; JOHN F. MCCORMACK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US3650777A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1972</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>JOHN DUFF WILLIAMSON</creatorcontrib><creatorcontrib>FREDERICK W. SCHNEBLE JR</creatorcontrib><creatorcontrib>RUDOLPH J. ZEBLISKY</creatorcontrib><creatorcontrib>JOHN F. MCCORMACK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JOHN DUFF WILLIAMSON</au><au>FREDERICK W. SCHNEBLE JR</au><au>RUDOLPH J. ZEBLISKY</au><au>JOHN F. MCCORMACK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTROLESS COPPER PLATING</title><date>1972-03-21</date><risdate>1972</risdate><abstract>An improved aqueous autocatalytic copper deposition solution is provided which comprises maintaining in a solution, containing complexing and reducing agents for the copper ion and a pH adjuster, a small effective amount of a compound providing a metal value selected from the group consisting of molybdenum, niobium, tungsten, rhenium, rare earths of the actinide series, rare earths of the lanthanide series, and mixtures of the foregoing. Additionally, an improved method of depositing electroless copper is provided which comprises employing the solution hereinabove defined.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US3650777A
source esp@cenet
subjects CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title ELECTROLESS COPPER PLATING
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-05T20%3A15%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JOHN%20DUFF%20WILLIAMSON&rft.date=1972-03-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS3650777A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true