Correction Method and Correction Device

Provided is a correction method capable of reducing defocus in an image caused by variations in height of a semiconductor pattern by image processing performed after imaging. This correction method for correcting an image includes: acquiring a target image 801 in which a semiconductor pattern having a plurality of areas the height of which varies step-wisely is imaged; storing a plurality of correction coefficients C1 and the like for correcting the respective areas of the acquired target image 801; and correcting the respective areas of the target image 801 using the stored plurality of correction coefficients C1 and the like.