Electron Beam Patterning System in Additive Manufacturing

A method and an apparatus involve applying a pattern on an addressable patternable cathode unit. The cathode unit is stimulated to emit an electron beam pattern. A patterned image in the electron beam pattern is positioned to a desired position such directly to as a powder bed for additive manufactu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Toomre, Erik, DeMuth, James A, Fees, Heiner, Berdichevsky, Eugene, Leard, Francis L, Kamshad, Kourosh
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A method and an apparatus involve applying a pattern on an addressable patternable cathode unit. The cathode unit is stimulated to emit an electron beam pattern. A patterned image in the electron beam pattern is positioned to a desired position such directly to as a powder bed for additive manufacturing or to an electron beam addressed light valve for controlling spatial patterns on an optical signal for powder bed manufacturing.