Electron Beam Patterning System in Additive Manufacturing
A method and an apparatus involve applying a pattern on an addressable patternable cathode unit. The cathode unit is stimulated to emit an electron beam pattern. A patterned image in the electron beam pattern is positioned to a desired position such directly to as a powder bed for additive manufactu...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A method and an apparatus involve applying a pattern on an addressable patternable cathode unit. The cathode unit is stimulated to emit an electron beam pattern. A patterned image in the electron beam pattern is positioned to a desired position such directly to as a powder bed for additive manufacturing or to an electron beam addressed light valve for controlling spatial patterns on an optical signal for powder bed manufacturing. |
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