SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

A substrate processing apparatus includes a processor configured to process a substrate with a processing liquid. The processor has a holder configured to hold the substrate horizontally. The holder includes a first holder configured to come into contact with a center of a bottom surface of the subs...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Obaru, Takanori, Kurusu, Kento
Format: Patent
Sprache:eng
Schlagworte:
CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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Beschreibung
Zusammenfassung:A substrate processing apparatus includes a processor configured to process a substrate with a processing liquid. The processor has a holder configured to hold the substrate horizontally. The holder includes a first holder configured to come into contact with a center of a bottom surface of the substrate. The processor has a rotation driver configured to rotate the first holder around a vertical rotation axis. The substrate processing apparatus includes a charging member configured to charge a second substrate prepared separately from the substrate; and a controller configured to perform bringing the second substrate charged by the charging member into contact with the first holder.