SEMICONDUCTOR LAYER WITH DRY DEPOSITION LAYER

An intermediary layer, such as a dry deposition layer or a surface finish, is deposited on at least one exposed surface of surfaces within a layer of a semiconductor substrate. The intermediary layer is deposited on at least an electrically conductive material within a cavity in a layer. The interme...

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Bibliographische Detailangaben
Hauptverfasser: Grujicic, Darko, Sounart, Thomas L, Cho, Steve, Wall, Marcel Arlan, Azimi, Hamid, Pietambaram, Srinivas Venkata Ramanuja, Kaviani, Shayan, Duong, Benjamin, Han, Jung Kyu, Nad, Suddhasattwa, Duan, Gang, Manepalli, Rahul N
Format: Patent
Sprache:eng
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Zusammenfassung:An intermediary layer, such as a dry deposition layer or a surface finish, is deposited on at least one exposed surface of surfaces within a layer of a semiconductor substrate. The intermediary layer is deposited on at least an electrically conductive material within a cavity in a layer. The intermediary layer is deposited using a chemical deposition process such as physical vapor deposition, chemical vapor deposition or sputtering.