SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME

Disclosed are semiconductor devices and their fabrication methods. The semiconductor device comprises a substrate including an active pattern; a channel pattern on the active pattern; a source/drain pattern electrically connected to the channel pattern; a gate electrode on the channel pattern; an interlayer dielectric layer on the gate electrode, wherein the interlayer dielectric layer includes a recess; a via in the recess; a wiring line on the interlayer dielectric layer and electrically connected to the via; and an adhesion layer between the wiring line and an upper surface of the interlayer dielectric layer, wherein an upper surface of the via is closer than the upper surface of the interlayer dielectric layer to the substrate in a first direction, wherein the first direction is perpendicular to an upper surface of the substrate and wherein a portion of the adhesion layer is on a portion of an inner sidewall of the recess.