SPARK GAP STRUCTURES FOR ELECTRICAL OVERSTRESS DETECTION AND PROTECTION

Apparatuses including spark gap structures for electrical overstress (EOS) monitoring or protection, and associated methods, are disclosed. In an aspect, a vertical spark gap device includes a substrate having a horizontal main surface, a first conductive layer and a second conductive layer each ext...

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Bibliographische Detailangaben
Hauptverfasser:	McGuinness, Patrick Martin, Jolondcovschi, Stanislav, Lynch, Michael P, Maher, Paul Joseph, Twohig, Michael James, Kubik, Jan, Bradley, Shaun, Schmitt, Jochen, Linehan, Andrew Christopher, Coyne, Edward John, Wallrabenstein, John Ross, Cosgrave, Gavin Patrick, McMahon, Anne M, Cleary, John Anthony, Fitzgerald, Padraig L, McSherry, Mary, Burke, Cillian, Clarke, David J, Heffernan, Stephen Denis, Aherne, David, O'Donnell, Alan J
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CORONA DEVICES ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS OVERVOLTAGE ARRESTERS USING SPARK GAPS PRINTED CIRCUITS SPARK GAPS SPARKING PLUGS
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Beschreibung
Zusammenfassung:	Apparatuses including spark gap structures for electrical overstress (EOS) monitoring or protection, and associated methods, are disclosed. In an aspect, a vertical spark gap device includes a substrate having a horizontal main surface, a first conductive layer and a second conductive layer each extending over the substrate and substantially parallel to the horizontal main surface while being separated in a vertical direction crossing the horizontal main surface. One of the first and second conductive layers is electrically connected to a first voltage node and the other of the first and second conductive layers is electrically connected to a second voltage node. The first and second conductive layers serve as one or more arcing electrode pairs and have overlapping portions configured to generate one or more arc discharges extending generally in the vertical direction in response to an EOS voltage signal received between the first and second voltage nodes.