ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUND

An actinic ray-sensitive or radiation-sensitive resin composition comprising a compound (Q) represented by a formula (I-1) below and a resin having a polarity that increases through decomposition by an action of an acid,wherein, in the formula (I-1), R1 represents a hydrocarbon group having at least...

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Bibliographische Detailangaben
Hauptverfasser:	Fujimaki, Nishiki, Shirakawa, Michihiro, Hiura, Nobuhiro, Mori, Takahiro, Kojima, Masafumi, UEMURA, Minoru, Goto, Akiyoshi, Marumo, Kazuhiro
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	An actinic ray-sensitive or radiation-sensitive resin composition comprising a compound (Q) represented by a formula (I-1) below and a resin having a polarity that increases through decomposition by an action of an acid,wherein, in the formula (I-1), R1 represents a hydrocarbon group having at least one or more fluorine atoms, R2 represents an aromatic group, Y represents -SO2- or -CO-, and X+ represents a counter cation.