GENERATING SYNTHETIC MICROSPY IMAGES OF SUBSTRATES

A method includes processing measurement data of a substrate that was processed according to a manufacturing process using a first trained machine learning model to predict a critical dimension (CD) profile for the substrate. The method further includes generating a CD profile prediction image based...

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Hauptverfasser:	Hong, Jeong Jin, Cheon, Sejune, Kim, Sang Hong
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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creator	Hong, Jeong Jin Cheon, Sejune Kim, Sang Hong
description	A method includes processing measurement data of a substrate that was processed according to a manufacturing process using a first trained machine learning model to predict a critical dimension (CD) profile for the substrate. The method further includes generating a CD profile prediction image based on the predicted CD profile for the substrate. The method further includes processing the CD profile prediction image using a second trained machine learning model to generate a synthetic microscopy image associated with the substrate.
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subjects	CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
title	GENERATING SYNTHETIC MICROSPY IMAGES OF SUBSTRATES
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