GENERATING SYNTHETIC MICROSPY IMAGES OF SUBSTRATES

A method includes processing measurement data of a substrate that was processed according to a manufacturing process using a first trained machine learning model to predict a critical dimension (CD) profile for the substrate. The method further includes generating a CD profile prediction image based...

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Bibliographische Detailangaben
Hauptverfasser:	Hong, Jeong Jin, Cheon, Sejune, Kim, Sang Hong
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A method includes processing measurement data of a substrate that was processed according to a manufacturing process using a first trained machine learning model to predict a critical dimension (CD) profile for the substrate. The method further includes generating a CD profile prediction image based on the predicted CD profile for the substrate. The method further includes processing the CD profile prediction image using a second trained machine learning model to generate a synthetic microscopy image associated with the substrate.