SEMICONDUCTOR STRUCTURES AND METHODS FOR FORMING THE SAME

SEMICONDUCTOR STRUCTURES AND METHODS FOR FORMING THE SAME

A semiconductor structure is provided. The semiconductor structure includes a substrate; a dielectric layer on the substrate; isolation structures extending through the dielectric layer into the substrate; and a floating gate on the dielectric layer and between the isolation structures, wherein the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WEI, Ying-Chang, CHANG, Jung-Ho, WANG, Chao-Lung, LIAO, Hsiu-Han
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A semiconductor structure is provided. The semiconductor structure includes a substrate; a dielectric layer on the substrate; isolation structures extending through the dielectric layer into the substrate; and a floating gate on the dielectric layer and between the isolation structures, wherein the floating gate includes a first portion directly on the dielectric layer; and second portions on the sidewalls of the first portion.