METHODS AND APPARATUS FOR IMPLEMENTING CAPACITORS IN SEMICONDUCTOR DEVICES

Methods and apparatus are disclosed for implementing capacitors in semiconductor devices. An example semiconductor die includes a first dielectric material disposed between a first metal interconnect and a second metal interconnect; and a capacitor positioned within a via extending through the first...

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Bibliographische Detailangaben
Hauptverfasser: Baumgartner, Peter, Langenbuch, Michael, Moran Guizan, Carla, Seidemann, Georg, Yakkegondi Virupakshappa, Mamatha, Riess, Philipp, Sachithanandan, Roshini, Jensen, Jonathan
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Methods and apparatus are disclosed for implementing capacitors in semiconductor devices. An example semiconductor die includes a first dielectric material disposed between a first metal interconnect and a second metal interconnect; and a capacitor positioned within a via extending through the first dielectric material between the first and second metal interconnects, the capacitor including a second dielectric material disposed in the via between the first and second metal interconnects.