SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus includes a substrate holder having a plate positioned below a substrate; and substrate gripping members provided on a periphery of the plate, the plate having notches at the periphery thereof; a rotational driver; lift pins configured to support a periphery of the su...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Mimaki, Yukihiro, Moriyama, Ryosuke
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A substrate processing apparatus includes a substrate holder having a plate positioned below a substrate; and substrate gripping members provided on a periphery of the plate, the plate having notches at the periphery thereof; a rotational driver; lift pins configured to support a periphery of the substrate from below and configured to be moved up and down; sliding members provided on the plate to be slid in a horizontal direction, each of the sliding members being configured to be moved between a closing position where the notch is closed and an opening position where the notch is opened to allow the lift pin to be moved up and down through the notch; and operating members configured to be moved up and down, each of the operating members being configured to slide the sliding member by being moved up and down while being engaged with the sliding member.