MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSITIVITY TO DRIFT AND DAMAGES

A multi-beam generating unit of a multi-beam charged particle imaging system can exhibit reduced sensitivity to drift and extended lifetime. Drifts due to x-ray irradiation and thermal loads can be minimized by a combination of at least one of a shielding element, a cooling member, or an architectur...

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Bibliographische Detailangaben
Hauptverfasser:	Wertz, Alexander, Riedesel, Christof, Lenke, Ralf, Kaestner, Marcus, Kurij, Georg, Sarov, Yanko, Schumacher, Dieter, Kelp, Michael, Bihr, Ulrich
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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Beschreibung
Zusammenfassung:	A multi-beam generating unit of a multi-beam charged particle imaging system can exhibit reduced sensitivity to drift and extended lifetime. Drifts due to x-ray irradiation and thermal loads can be minimized by a combination of at least one of a shielding element, a cooling member, or an architecture and method for operating an active multi-aperture element. A lifetime can be improved by annealing methods of an active multi-aperture element or a microelectronic device forming for example a voltage supply unit.