FIRST HOLDING APPARATUS, THIRD HOLDING APPARATUS, FIFTH HOLDING APPARATUS, TRANSPORT SYSTEM, EXPOSURE SYSTEM, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

An exposure system exposing system capable of exposing wafer transported from coating apparatus capable of coating photosensitive material onto wafer, including: holding apparatus including first holding part holding first surface of wafer transported from coating apparatus; measurement apparatus including first measurement part having at least first measurement region and capable of measuring position in first direction of second surface on side opposite to first surface of wafer held by first holding part and second measurement part having at least one second measurement region different from first measurement region and capable of measuring position in first direction of first or second surface of wafer; exposure apparatus exposing the wafer with energy beam; transport apparatus transporting wafer from measurement apparatus to exposure apparatus; and control apparatus, wherein control apparatus determines whether or not wafer is transported toward exposure apparatus by transport apparatus based on measurement result of first and second measurement parts.