METROLOGY OF NANOSHEET SURFACE ROUGHNESS AND PROFILE

An inspection system includes a controller including a memory maintaining program instructions and one or more processors configured to execute the program instructions. The program instructions cause the one or more processors to generate a geometric model of a structure of a sample, generate an op...

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Bibliographische Detailangaben
Hauptverfasser:	Chouaib, Houssam, Chang, HaoMiao, Zhan, Tianrong, Gu, Teng, Lagodzinski, Andrew, Tan, Zhengquan
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An inspection system includes a controller including a memory maintaining program instructions and one or more processors configured to execute the program instructions. The program instructions cause the one or more processors to generate a geometric model of a structure of a sample, generate an optical response function model of the structure of the sample to illumination based at least in part on the geometric model, receive measured data from a detector, generate a parametric sub-structure model based on at least the optical response function model and the measured data, and extract one or more parameters of the structure based on the measured data.