METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE
An apparatus for manufacturing a semiconductor device includes a fluid dispense nozzle configured to dispense a photoresist composition on a semiconductor substrate, and a first camera configured to obtain a first image of the fluid dispense nozzle. The apparatus further includes a second camera con...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | TSENG, Wei-Hsiang CHANG, Jing YANG, Ching-Hai |
| description | An apparatus for manufacturing a semiconductor device includes a fluid dispense nozzle configured to dispense a photoresist composition on a semiconductor substrate, and a first camera configured to obtain a first image of the fluid dispense nozzle. The apparatus further includes a second camera configured to obtain a second image of the fluid dispense nozzle, the second image having a higher resolution than the first image, and an image recognition system operably coupled to the first and second cameras. The image recognition system includes a memory storing instructions and at least one processor that executes the instructions to obtain an image of a benchmark fluid dispense nozzle using the second camera, and determine a width of the benchmark fluid dispense nozzle at multiple intervals along the benchmark fluid dispense nozzle and a width of a spray pattern of the photoresist composition being dispensed from the benchmark fluid dispense nozzle. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2024377750A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2024377750A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2024377750A13</originalsourceid><addsrcrecordid>eNrjZLD1dQ3x8HdRcPQD4oAAxyDHkNBgBTf_IAVnf8cQTz93hQAP_xD_INdgz-AQBf8w1yAFR4XgUKfgEKBKVx4G1rTEnOJUXijNzaDs5hri7KGbWpAfn1pckJicmpdaEh8abGRgZGJsbm5uauBoaEycKgDiJyrx</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE</title><source>esp@cenet</source><creator>TSENG, Wei-Hsiang ; CHANG, Jing ; YANG, Ching-Hai</creator><creatorcontrib>TSENG, Wei-Hsiang ; CHANG, Jing ; YANG, Ching-Hai</creatorcontrib><description>An apparatus for manufacturing a semiconductor device includes a fluid dispense nozzle configured to dispense a photoresist composition on a semiconductor substrate, and a first camera configured to obtain a first image of the fluid dispense nozzle. The apparatus further includes a second camera configured to obtain a second image of the fluid dispense nozzle, the second image having a higher resolution than the first image, and an image recognition system operably coupled to the first and second cameras. The image recognition system includes a memory storing instructions and at least one processor that executes the instructions to obtain an image of a benchmark fluid dispense nozzle using the second camera, and determine a width of the benchmark fluid dispense nozzle at multiple intervals along the benchmark fluid dispense nozzle and a width of a spray pattern of the photoresist composition being dispensed from the benchmark fluid dispense nozzle.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CALCULATING ; CINEMATOGRAPHY ; COMPUTING ; CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; COUNTING ; ELECTRIC COMMUNICATION TECHNIQUE ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; HOLOGRAPHY ; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL ; MATERIALS THEREFOR ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PICTORIAL COMMUNICATION, e.g. TELEVISION ; REGULATING ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241114&DB=EPODOC&CC=US&NR=2024377750A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241114&DB=EPODOC&CC=US&NR=2024377750A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TSENG, Wei-Hsiang</creatorcontrib><creatorcontrib>CHANG, Jing</creatorcontrib><creatorcontrib>YANG, Ching-Hai</creatorcontrib><title>METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE</title><description>An apparatus for manufacturing a semiconductor device includes a fluid dispense nozzle configured to dispense a photoresist composition on a semiconductor substrate, and a first camera configured to obtain a first image of the fluid dispense nozzle. The apparatus further includes a second camera configured to obtain a second image of the fluid dispense nozzle, the second image having a higher resolution than the first image, and an image recognition system operably coupled to the first and second cameras. The image recognition system includes a memory storing instructions and at least one processor that executes the instructions to obtain an image of a benchmark fluid dispense nozzle using the second camera, and determine a width of the benchmark fluid dispense nozzle at multiple intervals along the benchmark fluid dispense nozzle and a width of a spray pattern of the photoresist composition being dispensed from the benchmark fluid dispense nozzle.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CALCULATING</subject><subject>CINEMATOGRAPHY</subject><subject>COMPUTING</subject><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>COUNTING</subject><subject>ELECTRIC COMMUNICATION TECHNIQUE</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>HOLOGRAPHY</subject><subject>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</subject><subject>MATERIALS THEREFOR</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PICTORIAL COMMUNICATION, e.g. TELEVISION</subject><subject>REGULATING</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD1dQ3x8HdRcPQD4oAAxyDHkNBgBTf_IAVnf8cQTz93hQAP_xD_INdgz-AQBf8w1yAFR4XgUKfgEKBKVx4G1rTEnOJUXijNzaDs5hri7KGbWpAfn1pckJicmpdaEh8abGRgZGJsbm5uauBoaEycKgDiJyrx</recordid><startdate>20241114</startdate><enddate>20241114</enddate><creator>TSENG, Wei-Hsiang</creator><creator>CHANG, Jing</creator><creator>YANG, Ching-Hai</creator><scope>EVB</scope></search><sort><creationdate>20241114</creationdate><title>METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE</title><author>TSENG, Wei-Hsiang ; CHANG, Jing ; YANG, Ching-Hai</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2024377750A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CALCULATING</topic><topic>CINEMATOGRAPHY</topic><topic>COMPUTING</topic><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>COUNTING</topic><topic>ELECTRIC COMMUNICATION TECHNIQUE</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>HOLOGRAPHY</topic><topic>IMAGE DATA PROCESSING OR GENERATION, IN GENERAL</topic><topic>MATERIALS THEREFOR</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PICTORIAL COMMUNICATION, e.g. TELEVISION</topic><topic>REGULATING</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>TSENG, Wei-Hsiang</creatorcontrib><creatorcontrib>CHANG, Jing</creatorcontrib><creatorcontrib>YANG, Ching-Hai</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TSENG, Wei-Hsiang</au><au>CHANG, Jing</au><au>YANG, Ching-Hai</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE</title><date>2024-11-14</date><risdate>2024</risdate><abstract>An apparatus for manufacturing a semiconductor device includes a fluid dispense nozzle configured to dispense a photoresist composition on a semiconductor substrate, and a first camera configured to obtain a first image of the fluid dispense nozzle. The apparatus further includes a second camera configured to obtain a second image of the fluid dispense nozzle, the second image having a higher resolution than the first image, and an image recognition system operably coupled to the first and second cameras. The image recognition system includes a memory storing instructions and at least one processor that executes the instructions to obtain an image of a benchmark fluid dispense nozzle using the second camera, and determine a width of the benchmark fluid dispense nozzle at multiple intervals along the benchmark fluid dispense nozzle and a width of a spray pattern of the photoresist composition being dispensed from the benchmark fluid dispense nozzle.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2024377750A1 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING COUNTING ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PICTORIAL COMMUNICATION, e.g. TELEVISION REGULATING SEMICONDUCTOR DEVICES |
| title | METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-09T00%3A35%3A47IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TSENG,%20Wei-Hsiang&rft.date=2024-11-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2024377750A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |