METHOD AND APPARATUS FOR COATING PHOTORESIST OVER A SUBSTRATE

An apparatus for manufacturing a semiconductor device includes a fluid dispense nozzle configured to dispense a photoresist composition on a semiconductor substrate, and a first camera configured to obtain a first image of the fluid dispense nozzle. The apparatus further includes a second camera con...

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Bibliographische Detailangaben
Hauptverfasser:	TSENG, Wei-Hsiang, CHANG, Jing, YANG, Ching-Hai
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING COUNTING ELECTRIC COMMUNICATION TECHNIQUE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PICTORIAL COMMUNICATION, e.g. TELEVISION REGULATING SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An apparatus for manufacturing a semiconductor device includes a fluid dispense nozzle configured to dispense a photoresist composition on a semiconductor substrate, and a first camera configured to obtain a first image of the fluid dispense nozzle. The apparatus further includes a second camera configured to obtain a second image of the fluid dispense nozzle, the second image having a higher resolution than the first image, and an image recognition system operably coupled to the first and second cameras. The image recognition system includes a memory storing instructions and at least one processor that executes the instructions to obtain an image of a benchmark fluid dispense nozzle using the second camera, and determine a width of the benchmark fluid dispense nozzle at multiple intervals along the benchmark fluid dispense nozzle and a width of a spray pattern of the photoresist composition being dispensed from the benchmark fluid dispense nozzle.