SEMICONDUCTOR DEVICE

An example semiconductor device includes an active region extending in a first direction and including first conductivity-type impurities, an ion doped region extending in the first direction in the active region and including second conductivity-type impurities, a gate structure extending in a second direction, intersecting the first direction, disposed on the active region and traversing the active region, a source/drain region on the active region on at least one side of the gate structure, a device isolation layer surrounding the active region, an interlayer insulating layer on the device isolation layer and covering the gate structure and the source/drain region, a vertical power structure extending in a third direction, perpendicular to the first and second directions, and passing through the device isolation layer and the interlayer insulating layer, and a bottom wiring connected to the vertical power structure and contacting a bottom surface of the active region.