CLEANING CHAMBER FOR METAL OXIDE REMOVAL

CLEANING CHAMBER FOR METAL OXIDE REMOVAL

In some embodiments, the present disclosure relates to a process tool that includes a chamber housing defining a processing chamber. Within the processing chamber is a wafer chuck configured to hold a substrate. Further, a bell jar structure is arranged over the wafer chuck such that an opening of t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Lin, Yen-Liang, Zhong, Chia-Wen, Chang, Yao-Wen, Lee, Ru-Liang, Ching, Min-Chang, Tsai, Cheng-Yuan, Lu, Kuo-Liang
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:In some embodiments, the present disclosure relates to a process tool that includes a chamber housing defining a processing chamber. Within the processing chamber is a wafer chuck configured to hold a substrate. Further, a bell jar structure is arranged over the wafer chuck such that an opening of the bell jar structure faces the wafer chuck. A plasma coil is arranged over the bell jar structure. An oxygen source coupled to the processing chamber and configured to input oxygen gas into the processing chamber.