DOPED PARTICULATE SILICON PARTICLE SIZE SELECTION

DOPED PARTICULATE SILICON PARTICLE SIZE SELECTION

Methods for doping a silicon melt with doped particulate silicon are disclosed. Maximum particle size of the doped particulate silicon may be controlled based on the impact region of the doped particulate silicon on the silicon melt.

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Bibliographische Detailangaben
Hauptverfasser: Ryu, JaeWoo, Ji, JunHwan, Hudson, Carissima Marie
Format: Patent
Sprache:eng
Schlagworte:
AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE
APPARATUS THEREFOR
CHEMISTRY
CRYSTAL GROWTH
METALLURGY
PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
REFINING BY ZONE-MELTING OF MATERIAL
SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE
SINGLE-CRYSTAL-GROWTH
UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:Methods for doping a silicon melt with doped particulate silicon are disclosed. Maximum particle size of the doped particulate silicon may be controlled based on the impact region of the doped particulate silicon on the silicon melt.