FILM FORMATION CONTROL DEVICE, FILM FORMATION DEVICE AND FILM FORMATION METHOD

Provided are a light source (42) that irradiates a substrate(S) with light, the substrate being disposed on a rotating body (25); a light receiving unit (46) that receives transmitted light or reflected light, the transmitted light being emitted from the light source and transmitted through a layer of a thin film formed on the substrate, the reflected light being emitted from the light source and reflected by the layer; a positional information acquisition unit (48) that acquires positional information corresponding to a position in a circumferential direction of the rotating body; and a control unit (4) that controls a film formation condition, the control unit comprising: a timing control unit that specifies a targeted position of the substrate based on the positional information in the circumferential direction of the rotating body acquired by the positional information acquisition unit and controls timing of receiving the transmitted light or reflected light of the light emitted from the light source to the substrate at the specified position; a film thickness determination unit that calculates a film thickness of each layer of the thin film composed of multiple layers based on the transmitted light or reflected light received by the light receiving unit and determines a film thickness difference between the film thickness of each layer and a target film thickness of each layer constituting the thin film having a desired spectral characteristic; and a film formation condition setting unit that, when the film thickness of each layer has the film thickness difference of a predetermined value or more with respect to the target film thickness, corrects the film formation condition for the layer having the film thickness difference so that the film thickness of the layer becomes the target film thickness, and then sets the film formation condition.