Semiconductor layout pattern and manufacturing method thereof
The invention provides a semiconductor layout pattern, which comprises a first metal layer, wherein the first metal layer comprises a plurality of first patterns and a plurality of fishbone line patterns arranged on the same layer, wherein each fishbone line pattern comprises a principal axis patter...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The invention provides a semiconductor layout pattern, which comprises a first metal layer, wherein the first metal layer comprises a plurality of first patterns and a plurality of fishbone line patterns arranged on the same layer, wherein each fishbone line pattern comprises a principal axis pattern extending along a first direction and a plurality of branches arranged along a second direction, and each first pattern is located between two adjacent branches and the principal axis pattern, and a second metal layer is located on the first metal layer. A plurality of magnetic tunnel junction (MTJ) elements located on the second metal layer, wherein each magnetic tunnel junction element is arranged in a rhombic shape. |
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