SEMICONDUCTOR DEVICE WITH FIN STRUCTURES

A semiconductor device structure is provided. The semiconductor device structure includes a substrate and a first fin structure, a second fin structure, and a third fin structure over the substrate. Tops of the second fin structure and the third fin structure are at different height levels. The semi...

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Bibliographische Detailangaben
Hauptverfasser: YANG, Chang-Ta, WANG, Ping-Wei, KENG, Wen-Chun, LIN, Yu-Kuan
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor device structure is provided. The semiconductor device structure includes a substrate and a first fin structure, a second fin structure, and a third fin structure over the substrate. Tops of the second fin structure and the third fin structure are at different height levels. The semiconductor device structure also includes a first epitaxial structure extending across sidewalls of the first fin structure and the second fin structure and a second epitaxial structure on the third fin structure. The first epitaxial structure is closer to the substrate than the second epitaxial structure.