METHOD FOR ORGANIC EFFLUENT ABATEMENT

A method and system for treating effluent from a processing chamber are disclosed herein. In one example, the effluent is treated by flowing a hydrocarbon processing gas into a processing chamber having a substrate disposed therein, performing a process on the substrate using the hydrocarbon process...

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Bibliographische Detailangaben
Hauptverfasser:	VAN GOMPEL, Joseph T, DOWNEY, Ryan T, L'HEUREUX, James
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method and system for treating effluent from a processing chamber are disclosed herein. In one example, the effluent is treated by flowing a hydrocarbon processing gas into a processing chamber having a substrate disposed therein, performing a process on the substrate using the hydrocarbon processing gas that creates organic byproducts, exhausting the organic byproducts from the processing chamber into a foreline having an abatement reaction zone, and treating the organic byproducts in the abatement reaction zone. The treating of the organic byproducts comprises mixing a disassociated oxygen-containing gas and the organic byproducts in the abatement reaction zone, and forming at least carbon monoxide and carbon dioxide from the mixture of the disassociated oxygen-containing gas and the organic byproducts.