BLANK MASK AND METHOD OF FABRICATING THE SAME

A method of fabricating a blank mask. The method includes forming a light-shielding film on a light-transmissive substrate to form an optical substrate; forming a photoresist layer on the light-shielding film; and removing droplets, generated in the forming of the photoresist layer, from a side surf...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, Tae Wan, LEE, Hyung Joo, SHIN, In Kyun
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A method of fabricating a blank mask. The method includes forming a light-shielding film on a light-transmissive substrate to form an optical substrate; forming a photoresist layer on the light-shielding film; and removing droplets, generated in the forming of the photoresist layer, from a side surface of the light-transmissive substrate, wherein the number of droplet-type adsorption, derived from the droplets, on the side surface of the light-transmissive substrate, is less than 3 per cm2.