COPOLYMER AND HOT MELT COMPOSITIONS COMPRISING SAID COPOLYMER

The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.01 to 10 wt. % of a) at least one co-polymerizable photoinitiator having an ethylenically unsaturated group and a moiety that is decompo...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	Roschkowski, Thomas, Schneider, Anja, Zimmermann, Lena
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE ADHESIVES CHEMISTRY COMPOSITIONS BASED THEREON DYES MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL ORGANIC MACROMOLECULAR COMPOUNDS PAINTS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS AS ADHESIVES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present application is directed to a copolymer obtained by free radical polymerization, said copolymer comprising, based on the total weight of monomers:from 0.01 to 10 wt. % of a) at least one co-polymerizable photoinitiator having an ethylenically unsaturated group and a moiety that is decomposable under photo-irradiation to form a radical;from 0.01 to 10 wt. % of b) at least one epoxy (meth)acrylate monomer having at least one (meth)acrylate group and at least one epoxide group; and,from 80 to 99.98 wt. % of c) at least one ethylenically unsaturated monomer which does not bear an epoxide group or a moiety decomposable under photo-irradiation to form a radical.The present application is further directed to a material which is crosslinkable under photoirradiation, said material comprising: a copolymer as defined above; and, at least one ionic photoacid generator (PAG).