APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT

An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein th...

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Bibliographische Detailangaben
Hauptverfasser:	HEIJMANS, Lucas Christiaan Johan, NIKIPELOV, Andrey, SMULDERS, Edwin Johannes Theodorus, SALMASO, Guido, DEHNER, Imre Rudolf Richard, VOORDECKERS, Luc, YAKUNIN, Andrei Mikhailovich, LAFARRE, Raymond Wilhelmus Louis, OTTENS, Cornelis Christiaan, VAN DE KERKHOF, Marcus Adrianus, COENEN, Martinus Jacobus Johannes, VANOTTERDIJK, Dennis, ANDE, Chaitanya Krishna
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.