PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER

A photosensitive resin composition includes a photopolymerizable compound; a photopolymerization initiator; a colorant; a binder resin; and a solvent, wherein the photopolymerizable compound includes a first photopolymerizable compound having 4 functional groups, a second photopolymerizable compound...

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Bibliographische Detailangaben
Hauptverfasser:	PARK, Donghyun, JEON, Youngmin, KWON, Hyuksin, KWON, Jihye, PARK, Baek Soung, KIM, Ickjin, PARK, Eunbi, JUNG, Juho
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	A photosensitive resin composition includes a photopolymerizable compound; a photopolymerization initiator; a colorant; a binder resin; and a solvent, wherein the photopolymerizable compound includes a first photopolymerizable compound having 4 functional groups, a second photopolymerizable compound having 6 functional groups, and a third photopolymerizable compound having 8 or more functional groups, and the photopolymerizable compound satisfies Equation 1:(x+z)/y>1[Equation⁢1]in Equation 1, x is the wt % of the first photopolymerizable compound based on a total weight of the photopolymerizable compound; y is the wt % of the second photopolymerizable compound based on the total weight of the photopolymerizable compound; and z is the wt % of the third photopolymerizable compound based on the total weight of the photopolymerizable compound.