IMAGING DEVICE, MANUFACTURING METHOD, AND ELECTRONIC DEVICE

There is provided an imaging device including: a first semiconductor substrate having a first region that includes a photoelectric conversion section and a via portion, a second region adjacent to the first region, a connection portion disposed at the second region, and a second semiconductor substr...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WAKIYAMA, Satoru, TAGAWA, Yukio
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:There is provided an imaging device including: a first semiconductor substrate having a first region that includes a photoelectric conversion section and a via portion, a second region adjacent to the first region, a connection portion disposed at the second region, and a second semiconductor substrate, wherein the connection portion electrically couples the first semiconductor substrate to the second semiconductor substrate in a stacked configuration, and wherein a width of the connection portion is greater than a width of the via portion.