ALIGNMENT MARK STRUCTURE AND METHOD FOR MAKING

The reflectance of a low-reflectance alignment mark is increased by coating the alignment mark with a high-reflectance film layer. This improves the strength of the light signal and reduces variation in the light signal.

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Bibliographische Detailangaben
Hauptverfasser:	Yeh, Tzu-Hao, Chen, Kuan-Jung, Chen, Hung-Lin, Lee, Tsung-Lin, Lin, Shiuan-Jeng
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The reflectance of a low-reflectance alignment mark is increased by coating the alignment mark with a high-reflectance film layer. This improves the strength of the light signal and reduces variation in the light signal.