SUBSTRATE PROCESSING APPARATUS, SUBSTRATE CHECKING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

A technique capable of performing an abnormality determination on each substrate transferred to a load lock chamber with less dependence a structure of the load lock chamber is described. A substrate processing apparatus includes: a substrate support provided in the load lock chamber and capable of supporting a plurality of substrates in a multistage manner at predetermined intervals; an elevator capable of elevating and lowering the substrate support; a plurality of sensors respectively provided on outer peripheral portions of the upper region and the lower region in the load lock chamber and configured to check a state of the substrate supported by the substrate support; and a controller including an abnormality determinator and configured to be capable of controlling the abnormality determinator configured to perform an abnormality determination on the substrate based on data respectively sent from the plurality of sensors and a predetermined threshold value.