PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOUND

Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:A description of Formula 1 is provided herein.

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Bibliographische Detailangaben
Hauptverfasser:	KIM, Hyeran, KWAK, Yoonhyun, IM, Kyuhyun, CHOI, Sungwon, KIM, Hana, AHN, Chanjae, KOH, Haengdeog, PARK, Hoyoon, KIM, Beomseok, KIM, Minsang
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:A description of Formula 1 is provided herein.