COMPOSITION AND METHOD FOR SELECTIVELY ETCHING SILICON NITRIDE

Compositions and methods for selectively etching silicon nitride relative to polysilicon, silicon oxide materials and/or silicide materials from a microelectronic device.

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Bibliographische Detailangaben
Hauptverfasser:	Park, Younghun, Hong, SeongJin, Kang, Yeonhui, Jeong, Jinwook, Yeo, Juhee, Kim, WonLae
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY DYES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES
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Beschreibung
Zusammenfassung:	Compositions and methods for selectively etching silicon nitride relative to polysilicon, silicon oxide materials and/or silicide materials from a microelectronic device.