POWER DISTRIBUTION STRUCTURE, MANUFACTURING METHOD, AND LAYOUT METHOD

An IC structure includes first and second complementary field-effect transistors (CFETs) positioned in a semiconductor wafer, each of the first and second CFETs including a gate structure extending in a first direction, an n-type channel extending through the gate structure in a second direction per...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LIN, Wei-Cheng, WU, Guo-Huei, LU, Lee-Chung, HOU, Yung-Chin, TZENG, Wei-Cheng, TZENG, Jiann-Tyng, ZHUANG, Hui-Zhong, PENG, Shih-Wei
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!