CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE

A correction method may include generating a first function that is a relational expression between a gray level of an edge beam among beams and a variation amount in size of a pattern according to a second beam adjacent to the edge beam, obtaining a second function that is a relational expression b...

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Hauptverfasser:	MIN, CHOULWON, BAE, SUKJONG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A correction method may include generating a first function that is a relational expression between a gray level of an edge beam among beams and a variation amount in size of a pattern according to a second beam adjacent to the edge beam, obtaining a second function that is a relational expression between the first function, the gray level of the edge beam, and a variation amount in a deviation amount of a CD and the deviation amount of the CD according to each of the beams, generating a matrix equation by adding all of second functions according to multi-beam combinations in which the beams are differently combined, deriving a solution of the matrix equation by measuring the deviation amount of the CD, and deriving an optimal dose of each of the beams by using the solution of the matrix equation.