SEMICONDUCTOR DIE AND METHOD OF MANUFACTURING THE SAME
The disclosure relates to a semiconductor die that includes a vertical transistor device having a gate electrode in a gate trench, and a MOS gated diode (MGD) having an MGD gate electrode in an MGD trench. The gate trench of the vertical transistor device has an elongated extension in a first latera...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The disclosure relates to a semiconductor die that includes a vertical transistor device having a gate electrode in a gate trench, and a MOS gated diode (MGD) having an MGD gate electrode in an MGD trench. The gate trench of the vertical transistor device has an elongated extension in a first lateral direction. The vertical transistor device and the MGD are arranged consecutively in the first lateral direction. |
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