OPTICAL DETECTION DEVICE, MANUFACTURING METHOD OF OPTICAL DETECTION DEVICE, AND ELECTRONIC APPARATUS

An optical detection device including a through electrode is provided. The optical detection device includes a first semiconductor layer having a photoelectric conversion region, a first surface, and a second surface that is a light entrance surface, a second semiconductor layer with a third surface...

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Bibliographische Detailangaben
Hauptverfasser:	OINOUE, Takashi, HANEDA, Masaki, SHIRASU, Yoshiki, FUJII, Yosuke, SAITO, Suguru, OHSHIMA, Keiji, KUROTORI, Takuya, SUGIYAMA, Tomohiro, SHIMOMURA, Kazuki, FUJII, Nobutoshi, TOKUOKA, Kenichi, HIRANO, Takaaki, ISHIMARU, Toshiyuki, MITSUHASHI, Ikue, KOTOO, Kengo, IMAI, Shinichi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An optical detection device including a through electrode is provided. The optical detection device includes a first semiconductor layer having a photoelectric conversion region, a first surface, and a second surface that is a light entrance surface, a second semiconductor layer with a third surface and a fourth surface, a second wiring layer overlapped with the third surface, a third wiring layer overlapped with the fourth surface, a first wiring layer with one surface overlapped with the first surface and another surface overlapped with one of the second wiring layer and the third wiring layer, a first conductor that has a first width, includes a first material, and penetrates the second semiconductor layer in a thickness direction, and a second conductor that has a second width smaller than the first width, includes a second material different from the first material, and penetrates the second semiconductor layer in the thickness direction.