METHOD AND SYSTEM FOR HIGH PHOTON ENERGIES IMAGING

A masking assembly is presented for use in inspecting a region of interest by creating structured high photon energy radiation to interact with the region of interest. The masking assembly comprises at least one mask structure, the mask structure having a predetermined effective thickness t, and com...

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Hauptverfasser: COHEN, Eliahu, SEFI, Or, SHWARTZ, Sharon, KLEIN, Yishay, SUKHOLUSKI, Shimon, BEN-YEHUDA, Adi
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creator COHEN, Eliahu
SEFI, Or
SHWARTZ, Sharon
KLEIN, Yishay
SUKHOLUSKI, Shimon
BEN-YEHUDA, Adi
description A masking assembly is presented for use in inspecting a region of interest by creating structured high photon energy radiation to interact with the region of interest. The masking assembly comprises at least one mask structure, the mask structure having a predetermined effective thickness t, and comprising a mask pattern formed by an arrangement of spaced-apart features of absorption properties with respect to said high photon energy radiation different from spaces between said features. The arrangement of said features along a lateral dimension of the pattern defines a predetermined effective pattern size P. The features have a characteristic lateral size/providing a substantially high aspect ratio t/l.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2024288595A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2024288595A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2024288595A13</originalsourceid><addsrcrecordid>eNrjZDDydQ3x8HdRcPRzUQiODA5x9VVw8w9S8PB091AI8PAP8fdTcPVzDXL3dA1W8PR1dPf0c-dhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGRiZGFhamlqaOhsbEqQIAAKQnrQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND SYSTEM FOR HIGH PHOTON ENERGIES IMAGING</title><source>esp@cenet</source><creator>COHEN, Eliahu ; SEFI, Or ; SHWARTZ, Sharon ; KLEIN, Yishay ; SUKHOLUSKI, Shimon ; BEN-YEHUDA, Adi</creator><creatorcontrib>COHEN, Eliahu ; SEFI, Or ; SHWARTZ, Sharon ; KLEIN, Yishay ; SUKHOLUSKI, Shimon ; BEN-YEHUDA, Adi</creatorcontrib><description>A masking assembly is presented for use in inspecting a region of interest by creating structured high photon energy radiation to interact with the region of interest. The masking assembly comprises at least one mask structure, the mask structure having a predetermined effective thickness t, and comprising a mask pattern formed by an arrangement of spaced-apart features of absorption properties with respect to said high photon energy radiation different from spaces between said features. The arrangement of said features along a lateral dimension of the pattern defines a predetermined effective pattern size P. The features have a characteristic lateral size/providing a substantially high aspect ratio t/l.</description><language>eng</language><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASUREMENT OF NUCLEAR OR X-RADIATION ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240829&amp;DB=EPODOC&amp;CC=US&amp;NR=2024288595A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240829&amp;DB=EPODOC&amp;CC=US&amp;NR=2024288595A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>COHEN, Eliahu</creatorcontrib><creatorcontrib>SEFI, Or</creatorcontrib><creatorcontrib>SHWARTZ, Sharon</creatorcontrib><creatorcontrib>KLEIN, Yishay</creatorcontrib><creatorcontrib>SUKHOLUSKI, Shimon</creatorcontrib><creatorcontrib>BEN-YEHUDA, Adi</creatorcontrib><title>METHOD AND SYSTEM FOR HIGH PHOTON ENERGIES IMAGING</title><description>A masking assembly is presented for use in inspecting a region of interest by creating structured high photon energy radiation to interact with the region of interest. The masking assembly comprises at least one mask structure, the mask structure having a predetermined effective thickness t, and comprising a mask pattern formed by an arrangement of spaced-apart features of absorption properties with respect to said high photon energy radiation different from spaces between said features. The arrangement of said features along a lateral dimension of the pattern defines a predetermined effective pattern size P. The features have a characteristic lateral size/providing a substantially high aspect ratio t/l.</description><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASUREMENT OF NUCLEAR OR X-RADIATION</subject><subject>MEASURING</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDydQ3x8HdRcPRzUQiODA5x9VVw8w9S8PB091AI8PAP8fdTcPVzDXL3dA1W8PR1dPf0c-dhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfGhwUYGRiZGFhamlqaOhsbEqQIAAKQnrQ</recordid><startdate>20240829</startdate><enddate>20240829</enddate><creator>COHEN, Eliahu</creator><creator>SEFI, Or</creator><creator>SHWARTZ, Sharon</creator><creator>KLEIN, Yishay</creator><creator>SUKHOLUSKI, Shimon</creator><creator>BEN-YEHUDA, Adi</creator><scope>EVB</scope></search><sort><creationdate>20240829</creationdate><title>METHOD AND SYSTEM FOR HIGH PHOTON ENERGIES IMAGING</title><author>COHEN, Eliahu ; SEFI, Or ; SHWARTZ, Sharon ; KLEIN, Yishay ; SUKHOLUSKI, Shimon ; BEN-YEHUDA, Adi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2024288595A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASUREMENT OF NUCLEAR OR X-RADIATION</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>COHEN, Eliahu</creatorcontrib><creatorcontrib>SEFI, Or</creatorcontrib><creatorcontrib>SHWARTZ, Sharon</creatorcontrib><creatorcontrib>KLEIN, Yishay</creatorcontrib><creatorcontrib>SUKHOLUSKI, Shimon</creatorcontrib><creatorcontrib>BEN-YEHUDA, Adi</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>COHEN, Eliahu</au><au>SEFI, Or</au><au>SHWARTZ, Sharon</au><au>KLEIN, Yishay</au><au>SUKHOLUSKI, Shimon</au><au>BEN-YEHUDA, Adi</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND SYSTEM FOR HIGH PHOTON ENERGIES IMAGING</title><date>2024-08-29</date><risdate>2024</risdate><abstract>A masking assembly is presented for use in inspecting a region of interest by creating structured high photon energy radiation to interact with the region of interest. The masking assembly comprises at least one mask structure, the mask structure having a predetermined effective thickness t, and comprising a mask pattern formed by an arrangement of spaced-apart features of absorption properties with respect to said high photon energy radiation different from spaces between said features. The arrangement of said features along a lateral dimension of the pattern defines a predetermined effective pattern size P. The features have a characteristic lateral size/providing a substantially high aspect ratio t/l.</abstract><oa>free_for_read</oa></addata></record>
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASUREMENT OF NUCLEAR OR X-RADIATION
MEASURING
PHYSICS
TESTING
title METHOD AND SYSTEM FOR HIGH PHOTON ENERGIES IMAGING
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-21T01%3A08%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=COHEN,%20Eliahu&rft.date=2024-08-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2024288595A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true