METHOD AND SYSTEM FOR HIGH PHOTON ENERGIES IMAGING

A masking assembly is presented for use in inspecting a region of interest by creating structured high photon energy radiation to interact with the region of interest. The masking assembly comprises at least one mask structure, the mask structure having a predetermined effective thickness t, and com...

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Bibliographische Detailangaben
Hauptverfasser: COHEN, Eliahu, SEFI, Or, SHWARTZ, Sharon, KLEIN, Yishay, SUKHOLUSKI, Shimon, BEN-YEHUDA, Adi
Format: Patent
Sprache:eng
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Zusammenfassung:A masking assembly is presented for use in inspecting a region of interest by creating structured high photon energy radiation to interact with the region of interest. The masking assembly comprises at least one mask structure, the mask structure having a predetermined effective thickness t, and comprising a mask pattern formed by an arrangement of spaced-apart features of absorption properties with respect to said high photon energy radiation different from spaces between said features. The arrangement of said features along a lateral dimension of the pattern defines a predetermined effective pattern size P. The features have a characteristic lateral size/providing a substantially high aspect ratio t/l.