SEMICONDUCTOR PRODUCTION SYSTEM AND METHOD

A semiconductor production system includes: a first chamber that is configured to be set to a first setting value and process wafers; a second chamber that is configured to be set to a second setting value and process the wafers processed in the first chamber; and a fault detection and classificatio...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, Donghyun, MAEDA, Shigenobu, PARK, Sangyoon, KIM, Kyungtae, YUN, Minhong
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A semiconductor production system includes: a first chamber that is configured to be set to a first setting value and process wafers; a second chamber that is configured to be set to a second setting value and process the wafers processed in the first chamber; and a fault detection and classification (FDC) modeling module configured to: train a first FDC machine learning model to generate, based on the first setting value and first FDC values sensed with respect to the wafers processed in the first chamber, first predicted FDC values with respect to first virtual wafers in the first chamber; and train a second FDC machine learning model to generate, based on the second setting value and second FDC values sensed with respect to the wafers processed in the second chamber, second predicted FDC values with respect to second virtual wafers in the second chamber.