SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

An apparatus includes a stage supporting a substrate with a material film on a first face from a second face side of the substrate. A light source generates a light beam. An optical system radiates the light beam to the substrate from the second face side. A detector detects a reflected light beam reflected from the substrate or the material film. A storage part stores therein reference spectrum waveforms generated in advance for shape parameters of the substrate or the material film with regard to the reflected light beam. An operation part compares a measured spectrum waveform obtained from an interference spectrum of the reflected light beam measured by the detector when the light beam is radiated with each of the reference spectrum waveforms to obtain a similar reference spectrum waveform that is one of the reference spectrum waveforms which is similar to the measured spectrum waveform.