PARTICLE MEASURING APPARATUS, ULTRAPURE WATER PRODUCTION APPARATUS HAVING THE SAME, AND PARTICLE MEASURING METHOD

A particle measuring apparatus is provided that has improved measurement accuracy regardless of particle diameters and that ensures prompt measurement. A particle measuring apparatus has: first and second particle counters that obtain a number of particles that are contained in water that flows in a...

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Bibliographische Detailangaben
Hauptverfasser:	SUDO, Fumio, KONDO, Tsukasa, ICHIHARA, Fumitaka, SUGAWARA, Hiroshi
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS TESTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	A particle measuring apparatus is provided that has improved measurement accuracy regardless of particle diameters and that ensures prompt measurement. A particle measuring apparatus has: first and second particle counters that obtain a number of particles that are contained in water that flows in a predetermined section of an ultrapure water production apparatus; and particle number calculation means that calculates the number of the particles that are contained in the water that flows in the predetermined section for each particle diameter range based on measurement results of the first and second particle counters. The first particle counter and the second particle counter have different counting efficiencies.