WET ETCH FORMULATIONS AND RELATED METHODS

Wet etch compositions and related methods are provided herein. A wet etch composition for molybdenum, may include phosphoric acid, acetic acid, nitric acid, and an additive for reducing an oxidation rate of a MoOx layer. The additive may be present in an amount of 0.01% to 5% by weight based on a to...

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Bibliographische Detailangaben
Hauptverfasser: Hickox, Hunter Patrick, Lippy, Steven A, Das, Atanu K, Hsu, Chia-Jung
Format: Patent
Sprache:eng
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Zusammenfassung:Wet etch compositions and related methods are provided herein. A wet etch composition for molybdenum, may include phosphoric acid, acetic acid, nitric acid, and an additive for reducing an oxidation rate of a MoOx layer. The additive may be present in an amount of 0.01% to 5% by weight based on a total weight of the wet etch composition.